Atonarp Aston - Advanced Metrology to Increase Yield & Throughput

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atonarp.com/aston
See Atonarp at SEMICON West, booth #1369

 


Advanced Metrology to Increase Yield & Throughput

 
Innovations in metrology can significantly boost yield, throughput, and efficiency for semiconductor fabs. Atonarp Aston™ is helping to drive this innovation forward, as a robust compact mass spectrometer designed from the ground up to be the workhorse in-situ metrology tool for gas monitoring and control in semiconductor manufacturing. High quantitative accuracy, chemically specific data and real-time performance are combined with production-ready robustness and dependability, helping to increase process chamber throughput and maximize yields of high-precision, multi-layer material deposition and etch processes. With a high level of flexibility and an integrated plasma ionization source, Aston is a single tool ready to support the broadest class of semiconductor metrology needs, including the increasingly precise in-situ process management required in today’s industry. 

Joe Cestari, Atonarp's general manager, mass spectrometry, explains the advantages of the Aston mini-mass spectrometers over traditional methods of in-situ chamber analysis, such as optical emission spectroscopy (OES) and residual gas analysis (RGA). The unit features a rugged plasma ionization source and a self-cleaning ReGen mode.
 
Watch the video to learn more.
 


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